Title:
【発明の名称】ポジ型ホトレジスト組成物
Document Type and Number:
Japanese Patent JP3076523
Kind Code:
B2
Abstract:
The present invention provides a positive photoresist composition exhibiting superior sensitivity, definition and thermostability, and in addition, having excellent focal depth range properties. The positive photoresist composition comprises (A) an alkali-soluble resin; (B) a quinonediazide group-containing compound; and (C), for example, bis(4-hydroxy-2,3,5-trimethylphenyl)-2-hydroxyphenylmethane.
Inventors:
Hiroshi Hosoda
Taku Hirayama
Kousuke Doi
Satoshi Niikura
Hidekatsu Kohara
Toshimasa Nakayama
Taku Hirayama
Kousuke Doi
Satoshi Niikura
Hidekatsu Kohara
Toshimasa Nakayama
Application Number:
JP19143296A
Publication Date:
August 14, 2000
Filing Date:
July 02, 1996
Export Citation:
Assignee:
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
G03F7/004; G03F7/022; H01L21/027; (IPC1-7): G03F7/004; G03F7/022; H01L21/027
Domestic Patent References:
| JP9236924A | ||||
| JP8272091A |
Attorney, Agent or Firm:
Heihachi Hattori