Title:
VAPOR PHASE EPITAXY APPARATUS
Document Type and Number:
Japanese Patent JPH0613331
Kind Code:
A
Abstract:
PURPOSE: To provide a vapor phase epitaxy apparatus in which vapor reaction of material gases is suppressed and which simultaneously has high safety.
CONSTITUTION: A plurality of tubes 12 for transporting materials are connected to a flange 14 connected to a reaction tube 13. A plurality of gas passages are provided at the flange 14 so as not to mix material gases. A plurality of introducing tubes 15 are connected to material gas outlets of the flange 14 in the tube 13 so as to be hermetically sealed. The tubes 15 are disposed immediately before an upstream side of a substrate to transport the materials.
Inventors:
KATOU YOSHITAKE
Application Number:
JP19140092A
Publication Date:
January 21, 1994
Filing Date:
June 26, 1992
Export Citation:
Assignee:
NEC CORP
International Classes:
C30B25/14; H01L21/205; (IPC1-7): H01L21/205; C30B25/14
Attorney, Agent or Firm:
Chieko Tateno
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