PURPOSE: To obtain heat shielding glass having low reflecting characteristics of electrical radiation by laminating a thin film of Cr nitride, a thin film of Cr nitrogen oxide or oxygen nitride and a thin film of Ti oxide or oxygen nitride to one surface of a transparent glass substrate.
CONSTITUTION: One surface of a transparent glass substrate is coated with a thin film of Cr nitride having ≥1kΩ/square surface resistivity and 5-50nm film thickness as a first layer by DC magnetron sputtering method. Then the first layer is covered with a thin film of Cr nitrogen oxide or oxygen nitride having 1-10nm film thickness as a second layer and the second layer is coated with at least one thin film of Ti oxide or oxygen nitride of Ti, Ta, TiSi, Sn, Al and Si having 5-30nm film thickness to give the objective glass having ≥1kΩ/square surface resistivity of coated heat shielding film and showing a reflecting color tone of silver-based color from the glass face side of the glass.
TAKAYAMA MASAYA
YAMANAKA SHIGEYUKI
