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Patent Searching and Data


Title:
METHOD FOR REDUCING IMPURITY IN AQUEOUS MONOMER SOLUTION
Document Type and Number:
Japanese Patent JPH0748312
Kind Code:
A
Abstract:

PURPOSE: To provide a method for reducing the level of a carbonyl compd. in an aq. monomer soln. contg. a carbonyl compd. as an impurity.

CONSTITUTION: An aq. monomer soln. contg. an impurity is subjected to ultraviolet irradiation for about 2 min to about 5 hr. The aq. monomer soln. is pref. an aq. soln. of acrylic acid or methacrylic acid. The monomer concn. is most pref. about 20 wt.% to about 65 wt.%. Upon exposure of the monomer soln. to ultraviolet light, the fear of an desired polymer being produced increased with increasing the monomer concn. Carbonyl compds. present in the aq. monomer soln. include, e.g. acrolein, methacrolein, acetaldehyde, furfural, protoanemonin, formaldehyde, crotonaldehyde, acetone, and benz aldehyde.


Inventors:
UIRIAMU BOOA JIYUNIA
NERUSON AIBAN KUIROSU
Application Number:
JP12586194A
Publication Date:
February 21, 1995
Filing Date:
May 17, 1994
Export Citation:
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Assignee:
ROHM & HAAS
International Classes:
C07B63/00; C07C51/487; C07C57/07; (IPC1-7): C07C57/07
Attorney, Agent or Firm:
Minoru Senda (1 person outside)