Title:
【発明の名称】マグネトロン式スパッタリング装置
Document Type and Number:
Japanese Patent JP3063169
Kind Code:
B2
More Like This:
| WO/1997/004142 | METHODS FOR DEPOSITION OF MOLYBDENUM SULPHIDE |
| JP6641382 | Carbon film film formation method |
| JP3796517 | MAGNETRON SPUTTERING APPARATUS AND FILM FORMATION |
Inventors:
Hisayoshi Sano
Application Number:
JP41470790A
Publication Date:
July 12, 2000
Filing Date:
December 26, 1990
Export Citation:
Assignee:
SHIMADZU CORPORATION
International Classes:
C23C14/35; (IPC1-7): C23C14/35
Domestic Patent References:
| JP2205673A |
Attorney, Agent or Firm:
Yoshiaki Nishioka (2 outside)