Title:
【発明の名称】微小部分析方法
Document Type and Number:
Japanese Patent JP3094199
Kind Code:
B2
Abstract:
A method for analyzing a micro area in a micro area X-ray analyzing device which detects X-rays from a sample irradiated by a primary beam and analyzes the sample by analyzing spectra of the X-rays, which method includes selecting a combination of a plurality of stage positions in which an overlapped area of a plurality of primary beam spots nearly conforms with a predetermined analytical area, and calculating a common element of X-ray spectra acquired in the plural stage positions to obtain information on the predetermined analytical area and a background of the sample.
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Inventors:
Koichi Tamura
Application Number:
JP6530894A
Publication Date:
October 03, 2000
Filing Date:
April 01, 1994
Export Citation:
Assignee:
Seiko Instruments Inc.
International Classes:
G01N23/223; G01N23/22; G01N23/225; (IPC1-7): G01N23/223; G01N23/225
Domestic Patent References:
| JP7128259A |
Other References:
【文献】米国特許5541973(US,A)
Attorney, Agent or Firm:
Keinosuke Hayashi (1 person outside)