PURPOSE: To provide a cleaning device capable of keeping especially cleaned element to be processed in the clean state in relation to the multivessel type cleaning device cleaning elements such as semiconductor wafer or reticle, etc., by successively immersing the same in a processing solution.

CONSTITUTION: The cleaning device is composed of a clean bench 21, processing vessels 22-1-22-5 arranged in this clean bench 21 for containing processing solutions 12-1-12-5 of hot and thick sulfuric acid, etc., section means 31-1-31-4 sectioning the clean bench 21 in individual chambers corresponding to the processing vessels 22-1-22-5 for alternately cutting off and communicating the adjacent individual chambers with one another as well as exhaust means 32-1-32-5 exhausting the individual chambers.