PURPOSE: To obtain a new radiation-sensitive resin compsn. having higher sensitivity than a conventional one to various radiation such as deep UV rays and electron beams.

CONSTITUTION: The resist liquid is prepared by dissolving 0.5g of partial allylether of poly(hydroxystyrene) (with 50% ether rate) as the resin and 35mg of triphenylsulfonium trifluoromethane sulfonate as an acid producing agent to 3ml of methoxyethyl acetate, and then filtering the liquid through a membrane filter.