Title:
ナノ製造
Document Type and Number:
Japanese Patent JP2004527905
Kind Code:
A
Abstract:
Pathways to rapid and reliable fabrication of three-dimensional nanostructures are provided. Simple methods are described for the production of well-ordered, multilevel nanostructures. This is accomplished by patterning block copolymer templates with selective exposure to a radiation source. The resulting multi-scale lithographic template can be treated with post-fabrication steps to produce multilevel, three-dimensional, integrated nanoscale media, devices, and systems.
Inventors:
Tomminen, Mark Tee.
Russell, Thomas Peas.
Wazagh, Andrei
Bar, Mustafa
Russell, Thomas Peas.
Wazagh, Andrei
Bar, Mustafa
Application Number:
JP2002572644A
Publication Date:
September 09, 2004
Filing Date:
March 14, 2002
Export Citation:
Assignee:
University of Massachusetts
International Classes:
B82B1/00; G03F7/16; H01J1/304; H01J9/02; H01J31/12; H01L21/8246; H01L23/48; H01L27/105; H01L29/06; H01L35/28; H01L35/32; H01L43/08; (IPC1-7): H01L29/06; B82B1/00; H01J9/02; H01J31/12; H01L27/105; H01L43/08
Domestic Patent References:
| JP2001057146A | 2001-02-27 | |||
| JP2002141633A | 2002-05-17 | |||
| JP2001096499A | 2001-04-10 |
Foreign References:
| US5306661A | 1994-04-26 | |||
| US6187165B1 | 2001-02-13 |
Attorney, Agent or Firm:
Hironobu Onda
Makoto Onda
Makoto Onda