To provide a nanoimprint method and a nanoimprint apparatus in which reproducibility of a pattern to be formed is improved.

The nanoimprint method for forming a pattern on a substrate or a film provided on the substrate by using a mold includes steps of disposing a mold opposing to the substrate or the film provided on the substrate to leave a gap between the substrate or the film provided on the substrate and the mold, and applying a voltage between the mold and the substrate or the film provided on the substrate. The nanoimprint apparatus for forming a pattern on a substrate or a film provided on a substrate by using a mold includes a means of disposing the mold to oppose to the substrate or the film provided on the substrate to leave a gap between the substrate or the film provided on the substrate and the mold, and a means of applying a voltage between the mold and the substrate or the film provided on the substrate and the mold.