耐久性に優れたナノ粒子及びその製造方法 - Hitachi Software Engineering Co., Ltd.

Title:

耐久性に優れたナノ粒子及びその製造方法

Document Type and Number:

Japanese Patent JP4418220

Kind Code:

B2

Abstract:

The resistance of a semiconductor nanoparticle provided with a surface treatment, such as an OH coating or ammonia treatment, against external factors is improved. A semiconductor nanoparticle provided with a surface treatment such as an OH coating or ammonia treatment and having high-emission properties is coated with an organic material, such as hexylamine, dodecylamine, trioctylmethylammonium, tridodecilmethylammonium, and similar organic material, by migrating the semiconductor nanoparticle from an aqueous phase to an organic solvent, such as hexane or toluene, thereby providing it with durability against external factors.

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Inventors:

Keiichi Sato
Susumu Kuwabata

Application Number:

JP2003413856A

Publication Date:

February 17, 2010

Filing Date:

December 11, 2003

Export Citation:

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Assignee:

Hitachi Software Engineering Co., Ltd.

International Classes:

B82B1/00; G01N31/22; B82B3/00; C01G9/00; C01G11/00; C01G13/00; C01G15/00; C01G21/00; C01G41/00; C09C1/00; C09C1/36; C09C3/08; C09K11/56; G01N21/78

Foreign References:

US20030066998
WO2004065362A1

Attorney, Agent or Firm:

Yusuke Hiraki
Sekiya Mitsuo
Toshiaki Watanabe
Tsuruhiko Sekiguchi

Previous Patent: JPS4418219

Next Patent: 不織布シートの製造方法