Title:
NEGATIVE RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN BY USING THE SAME
Document Type and Number:
Japanese Patent JP3677482
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To improve the sensitivity and resolution of a chemically amplifying negative resist and to impart excellent post exposure delay property to the resist.
SOLUTION: The negative resist composition contains (A) copolymers of alkali-soluble hydroxyl styrene and styrene, (B) halogen-containing triazine compounds which generate acids by irradiation of radiation and (C) at least one kind of crosslinking agent selected from melamine resin and urea resin in which the N-site atoms are substituted with methylol groups or alkoxy methyl groups or both of the groups.
Inventors:
Mitsuru Sato
Katsumi Omori
Kiyoshi Ishikawa
Etsuko Iguchi
Fumitake Kaneko
Katsumi Omori
Kiyoshi Ishikawa
Etsuko Iguchi
Fumitake Kaneko
Application Number:
JP2002066051A
Publication Date:
August 03, 2005
Filing Date:
April 19, 1995
Export Citation:
Assignee:
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
G03F7/038; C08F212/06; C08F212/14; G03F7/004; H01L21/027; (IPC1-7): G03F7/038; G03F7/004
Domestic Patent References:
| JP10010733A | ||||
| JP8292559A | ||||
| JP9166870A | ||||
| JP7028240A | ||||
| JP5181277A | ||||
| JP5181278A | ||||
| JP4163552A | ||||
| JP4291258A | ||||
| JP6289614A | ||||
| JP5249663A |
Attorney, Agent or Firm:
Aun Agata
Takatoshi Mizuguchi
Takatoshi Mizuguchi
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