Title:
ネガ型レジスト組成物およびレジストパターン形成方法
Document Type and Number:
Japanese Patent JP4205061
Kind Code:
B2
Abstract:
A negative resist composition and a method of forming a resist pattern that are capable of suppressing resist pattern swelling are provided. The negative resist composition includes an alkali-soluble resin component (A), an acid generator component (B) that generates acid upon exposure, and a cross-linking agent component (C), wherein the alkali-soluble resin component (A) is a copolymer (A1) that includes a structural unit (a1) containing, within the main chain, an aliphatic cyclic group having a fluorinated hydroxyalkyl group, a structural unit (a2) derived from an acrylate ester which contains a hydroxyl group-containing chain-like or cyclic alkyl group and has a fluoroalkyl group or fluorine atom bonded to the alpha-position, and a structural unit (a3) derived from an acrylate ester which contains an aliphatic cyclic group having a fluorinated hydroxyalkyl group and has a fluoroalkyl group or fluorine atom bonded to the alpha-position.
Inventors:
Atsushi Iwashita
Application Number:
JP2005005013A
Publication Date:
January 07, 2009
Filing Date:
January 12, 2005
Export Citation:
Assignee:
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
G03F7/038; C08F220/22; C08F232/08; G03F7/004; H01L21/027
Domestic Patent References:
| JP2005003863A | ||||
| JP2005514659A | ||||
| JP2004217533A | ||||
| JP2000281729A |
Attorney, Agent or Firm:
Sumio Tanai
Masatake Shiga
Masakazu Aoyama
Suzuki Mitsuyoshi
Noriko Yanai
Masatake Shiga
Masakazu Aoyama
Suzuki Mitsuyoshi
Noriko Yanai
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