NEGATIVE SILOXANE RESIN COMPOSITION, PHOTOSPACER, COLOR FILTER SUBSTRATE, AND LIQUID CRYSTAL DISPLAY DEVICE

Title:

NEGATIVE SILOXANE RESIN COMPOSITION, PHOTOSPACER, COLOR FILTER SUBSTRATE, AND LIQUID CRYSTAL DISPLAY DEVICE

Document Type and Number:

Japanese Patent JP2017187754

Kind Code:

A

Abstract:

PROBLEM TO BE SOLVED: To provide a negative resin composition capable of forming a fine photospacer having extremely good development adhesion while having excellent mechanical characteristics such as hardness.SOLUTION: The negative siloxane resin composition contains (A) a polysiloxane having a carboxyl group and a radically polymerizable group, (B) a photoradical polymerization initiator, (C) a photopolymerizable monomer, (D) a thioxanthone-based sensitizer, and (E) a solvent. The content of the polysiloxane (A) is 5-40 pts.mass based on 100 pts.mass of the total of the polysiloxane (A) and the photopolymerizable monomer (C).SELECTED DRAWING: None

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Inventors:

FUKUOKA MASARU
SENOO MASAHIDE

Application Number:

JP2017052313A

Publication Date:

October 12, 2017

Filing Date:

March 17, 2017

Export Citation:

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Assignee:

TORAY INDUSTRIES

International Classes:

G03F7/075; C08F2/50; C08F290/14; G02B5/20; G02F1/1339; G03F7/027; G03F7/031; G03F7/20

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