Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
NEGATIVE TYPE PHOTOSENSITIVE MATERIAL
Document Type and Number:
Japanese Patent JPH10282680
Kind Code:
A
Abstract:

To ensure high sensitivity to Ar+ laser or YAG laser light and to improve the adhesiveness of a protective layer to a photopolymerizable layer without deteriorating developability and ink receptivity by forming a protective layer contg. a water-soluble vinyl polymer and a polymer having specified repeating units on a specified photopolymerizable layer.

This negative type photosensitive material has a photopolymerizable layer contg. an addition polymerizable compd. having at least one ethylenic unsatd. double bond, a photopolymn. initiator and a polymer binder and a protective layer contg. a water-soluble vinyl polymer and a polymer having repeating units represented by formula I or II on the photopolymerizable layer. In the formula I, II, each of R1 and R2 is H or alkyl, each of R11 and R12 is H, an aliphatic or arom. group, R11 and R12 may bond to each other to form a 5- or 6-membered N-contg. hetero ring, each of R21 and R22 is H, an aliphatic or arom. group, R21 and R22 may bond to each other to form a 5- or 6-membered N-contg. hetero ring and R23 is alkylene or arylene.


Inventors:
NAGASE HIROYUKI
HOSHI SATOSHI
Application Number:
JP8684397A
Publication Date:
October 23, 1998
Filing Date:
April 04, 1997
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
G03F7/027; C09D4/06; G03F7/00; G03F7/11; G03H1/02; H05K3/06; (IPC1-7): G03F7/11; G03F7/00; G03F7/027
Attorney, Agent or Firm:
Tadashi Hagino (3 outside)