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Title:
NEGATIVE TYPE RESIST COMPOSITION
Document Type and Number:
Japanese Patent JPS62113139
Kind Code:
A
Abstract:

PURPOSE: To prevent accumulation of electrostatic charge and to enable a micropattern to be formed without any slip of its position by partially converting polyvinylbenzyl chloride into quaternary ammonium, reacting it with lithium.tetracyanoquinodimethane (TCNQ) salt to partially form a salt type complex, and using the electrically conductive negative type resist composition thus obtained.

CONSTITUTION: Polyvinylbenzyl chloride having a molecular weight of about 40,000, and a dispersion degree of 1.5 is dissolved in 1,4-dioxane, triethylamine is added, stirred with heating until the cloudy solution becomes transparent, and 60% of the chloromethyl groups of the polymer is converted into trimethylammonium groups. The ethanol solution of this polymer and a solution of lithiumWTCNQ are mixed and stirred in a nirogen gas stream at room temperature to convert all the cation groups into the TCNQ salt complex. A silicon substrate is coated by the spin coating method with a cyclohexanone solution of this negative type resist material thus prepared, and then it is baked.


Inventors:
KAWASAKI YOKO
YONEDA YASUHIRO
SAITO KAZUMASA
MIYAGAWA MASASHI
Application Number:
JP25400285A
Publication Date:
May 25, 1987
Filing Date:
November 13, 1985
Export Citation:
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Assignee:
FUJITSU LTD
International Classes:
G03C1/00; G03F7/004; G03F7/038; (IPC1-7): G03C1/00
Attorney, Agent or Firm:
Sadaichi Igita



 
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