Title:
ネガ作動型超厚膜フォトレジスト
Document Type and Number:
Japanese Patent JP7274496
Kind Code:
B2
Abstract:
A negative working, aqueous base developable, photosensitive photoresist composition and a process of using this composition to produce lithographic images, where this composition is one comprising: a) a polymer containing the four repeat units of structures (1), (2), (3), and (4), but no other types of repeat units; wherein v, x, y and z, respectively, represent the mole % of each repeat units of structures (1), (2), (3) and (4); b) a radical photo-initiator component, which is comprised of at least one radical photo initiator which is activated by a broad absorption of radiation from about 360 nm to about 440 nm; c) a crosslinker component which is either a mixture consisting of crosslinkers of structure (5), (6) and (7), or a single crosslinker of structure (8); d) a radical inhibitor component; e) an optional surfactant component; f) an optional dissolution promoter component; and g) a solvent. The invention also relates to the process of using this negative resist to produce lithographic images.
Inventors:
Aritaka Hishida
Hiroshi Motobayashi
Lou Ray
Chen Chunwei
Lou Pin Hung
Ryu Weihong
Hiroshi Motobayashi
Lou Ray
Chen Chunwei
Lou Pin Hung
Ryu Weihong
Application Number:
JP2020550871A
Publication Date:
May 16, 2023
Filing Date:
March 20, 2019
Export Citation:
Assignee:
Merck Patent Gesellschaft mit beschraenkter Haftung
International Classes:
G03F7/027; C08F2/50; C08F220/30; C08F265/06; G03F7/004; G03F7/029; G03F7/033; G03F7/20
Domestic Patent References:
| JP2013097260A | ||||
| JP2009003366A | ||||
| JP2008309878A | ||||
| JP2018151489A | ||||
| JP4122938A | ||||
| JP2275955A | ||||
| JP60090204A | ||||
| JP60099111A | ||||
| JP61073705A | ||||
| JP2015521752A |
Foreign References:
| US20160139507 | ||||
| KR1020160118865B1 |
Attorney, Agent or Firm:
Mitsufumi Ezaki
Blacksmith Minoru Sawa
Katsuri Uenishi
Ichiro Torayama
Blacksmith Minoru Sawa
Katsuri Uenishi
Ichiro Torayama