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Title:
イオン注入機用の中性粒子検出器及びドーズ量測定制御装置並びに中性粒子を検出する方法
Document Type and Number:
Japanese Patent JP4196309
Kind Code:
B2
Abstract:
An improved neutral particle detector (52) for an ion implantation system (10) is provided for detecting the neutral particle content of an ion beam (28) which is comprised primarily of neutral particles and positively charged ions. The neutral particle detector (52) comprises (i) a deflector plate (78) residing at a negative electrical potential; (ii) a first collecting electrode (82) residing at a positive electrical potential with respect to said deflector plate (78) for collecting secondary electrons emitted by the deflector plate (78) as a result of neutral particles in the ion beam impacting the deflector plate (78); and (iii) a second collecting electrode (84) residing at a positive electrical potential with respect to said deflector plate (78) for collecting secondary electrons emitted by the deflector plate (78) as a result of positively charged ions in the ion beam impacting the deflector plate (78). The deflector plate (78) and the collecting electrodes (82, 84) are separated by a distance through which the ion beam passes. The neutral particle detector (52) determines the neutral particle fraction of the ion beam independent of the composition or pressure of the residual background gas through which the ion beam propagates.

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Inventors:
Victor Maurice Ben Benister
Application Number:
JP19409898A
Publication Date:
December 17, 2008
Filing Date:
July 09, 1998
Export Citation:
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Assignee:
Axcelis Technologies, Inc.
International Classes:
G01T1/29; H01J37/244; H01J37/317; H01J47/00
Domestic Patent References:
JP6139993A
JP61016456A
JP62040369A
JP52041583A
JP63221281A
JP50070087A
Attorney, Agent or Firm:
Calyx