Title:
新規化合物、及び該化合物の製造方法
Document Type and Number:
Japanese Patent JP6656639
Kind Code:
B2
Abstract:
The purpose of the present invention is to provide: a novel compound which can generate a base and radical upon the irradiation with an active energy ray; a photopolymerization initiator which comprises the novel compound; and a photosensitive resin composition which contains the photopolymerization initiator, has high sensitivity and excellent storage stability, and can be formed into a cured article that does not have a metal-corrosive property. The novel compound is represented by formula (1) (wherein R1 to R6 independently represent a hydrogen atom, a hydroxy group, an alkoxy group, an organic group other than the aforementioned substituents, or the like; X represents a residue having a structure such that n hydrogen atoms are removed from a saturated hydrocarbon containing a ring structure; and n represents an integer of 1 to 6).
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Inventors:
Research Terada
Kazuyoshi Yamamoto
Koji Arimitsu
Kazuyoshi Yamamoto
Koji Arimitsu
Application Number:
JP2017209360A
Publication Date:
March 04, 2020
Filing Date:
October 30, 2017
Export Citation:
Assignee:
Tokyo University of Science
NIPPON KAYAKU KABUSHIKI KAISHA
NIPPON KAYAKU KABUSHIKI KAISHA
International Classes:
C07C323/22; C07C319/20
Domestic Patent References:
| JP64080946A | ||||
| JP4033960A | ||||
| JP2012082247A | ||||
| JP2004163764A | ||||
| JP2004163765A | ||||
| JP2004163766A | ||||
| JP2006023580A | ||||
| JP2006023581A | ||||
| JP2006023582A | ||||
| JP2012181510A |
Foreign References:
| WO2008082224A1 | ||||
| WO2002092718A1 |
Other References:
J. Photopolym. Sci. Technol.,2014年,Vol.27, No.2,223-225
Attorney, Agent or Firm:
Yoichiro Uemura