Title:
NEW ESTER COMPOUND, HIGH MOLECULAR COMPOUND, RESIST MATERIAL, AND PATTERN FORMATION
Document Type and Number:
Japanese Patent JP3680920
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To obtain a new compound capable of obtaining a high molecular compound excellent in acid degradability, and, when the compound is formulated with a resist material as a base resin, further capable of providing a high molecular compound capable of achieving excellent sensitivity, resolution or the like.
SOLUTION: This new compound is the one of the formula [R1 is H, CH2CO2 R14 or the like; R2 is H, CO2R14 or the like; R3 is a 1-8C alkyl or a 6-20C (substituted) aryl; R4 to R13 are each H, a monovalent hydrocarbon or the like; R14 is a 1-15C alkyl; k is 0 or 1], e.g. exo-type 2-ethylbicyclo[2.2.1]heptan-2-yl 5-norbornene-2-carboxylate. The compound is obtained by carrying out a nucleophilic addition reaction to the carbonyl of bicyclo[2.2.1]heptan-2-one or its derivative to provide an endo-type alcohol, converting the obtained endo- type alcohol to an exo-type alcohol, and esterifying the obtained exo-type alcohol.
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Inventors:
Tsuyoshi Kanao
Tsunehiro Nishi
Hideshi Kurihara
Mutsuko Nakajima
Koji Hasegawa
Takeshi Watanabe
Tsunehiro Nishi
Hideshi Kurihara
Mutsuko Nakajima
Koji Hasegawa
Takeshi Watanabe
Application Number:
JP17494599A
Publication Date:
August 10, 2005
Filing Date:
June 22, 1999
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
C07C69/00; C07C69/753; C08F32/08; C08F34/00; C08F220/00; C08G61/08; C08L65/00; C09D167/00; G03F7/027; G03F7/039; G03F7/004; (IPC1-7): C07C69/753; C08F34/00; C08F220/00; C08G61/08; C08L65/00; G03F7/027
Domestic Patent References:
| JP1132625A | ||||
| JP1197460A | ||||
| JP2000089463A | ||||
| JP2000089462A | ||||
| JP2000089461A | ||||
| JP2000109525A | ||||
| JP11258802A |
Attorney, Agent or Firm:
Takashi Kojima
Yuko Nishikawa
Yuko Nishikawa