Title:
NEW ESTER COMPOUND, POLYMER COMPOUND, RESIST MATERIAL AND PATTERN-FORMING METHOD
Document Type and Number:
Japanese Patent JP3772249
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a new ester compound composed of a specific ester compound and useful as a raw material for a polymer compound having excellent decomposability with an acid.
SOLUTION: The objective compound is expressed by formula I (R1 is H, methyl or the like; R2 is H, CO2R4 or the like; R3 is a 1-8C alkyl or a 6-20C aryl; R4 is a 1-15C alkyl; (k) and (m) are each 0 or 1; (n) is 0-3), e.g. the compound of formula II. The compound of formula I can be produced by mixing a cyclic ketone compound, a halogenated alkyl, etc., and metallic magnesium, etc., in a solvent such as tetrahydrofuran, subjecting the mixture to heating, cooling, etc., as necessary to obtain a tertiary alcohol, mixing the tertiary alcohol with a base such as a carboxylic acid halide, e.g. acryloyl chloride in a solvent such as methylene chloride, subjecting the product to cooling, etc., to obtain an unsaturated acid ester, mixing a cyclopentadiene to the ester compound and subjecting to Diels-Alder reaction in the presence of a catalyst such as boron trifluoride optionally under heating, cooling, etc.
More Like This:
| WO/2002/006195 | CHIRAL COMPOUNDS II |
Inventors:
Takeshi Watanabe
Tsuyoshi Kanao
Tsunehiro Nishi
Mutsuko Nakajima
Koji Hasegawa
Jun Hatakeyama
Tsuyoshi Kanao
Tsunehiro Nishi
Mutsuko Nakajima
Koji Hasegawa
Jun Hatakeyama
Application Number:
JP12804499A
Publication Date:
May 10, 2006
Filing Date:
May 10, 1999
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
C07C69/753; C08F32/08; C08F32/00; G03F7/039; (IPC1-7): C08F32/00; C07C69/753; G03F7/039
Domestic Patent References:
| JP2001516804A |
Attorney, Agent or Firm:
Takashi Kojima
Yuko Nishikawa
Yuko Nishikawa