Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
NEW LACTONE COMPOUND HAVING ALICYCLIC STRUCTURE AND METHOD FOR PRODUCING THE SAME
Document Type and Number:
Japanese Patent JP3928690
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To provide a new lactone compound which polymerizes and gives a high energy beam sensitive resist material excellent in sensitivity, resolution, etching resistance, useful for microprocessing by an electron beam and far ultraviolet ray, especially capable of easily forming a fine pattern vertical to substrates because of low absorption in a wavelength of ArF excimer laser and KrF excimer laser and excellent in adhesiveness to the substrates, and suitable as a ultrafine pattern formation for production of VLSI.
SOLUTION: This lactone compound is represented by the following formula (1) [wherein k is 0 or 1; m is an integer satisfying the formula 1≤m≤8].


More Like This:
JPH069514[Title of Invention] Method for Producing γ-Hydroxydecanoic Acid and γ-Decalactone
JPH0611747[Title of Invention] Sulfone Anilide Compound
WO/2009/104605NOVEL INTERMEDIATE FOR SYNTHESIS OF ASCOFRANONE HAVING VARIOUS PHYSIOLOGICAL ACTIVITIES, AND NOVEL SHORTENED TOTAL SYNTHESIS METHOD FOR ASCOFRANONE USING THE SAME
Inventors:
Tsuyoshi Kanao
Takeshi Watanabe
Koji Hasegawa
Tsunehiro Nishi
Mutsuko Nakajima
Seiichiro Tachibana
Jun Hatakeyama
Application Number:
JP2000205217A
Publication Date:
June 13, 2007
Filing Date:
July 06, 2000
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
C07D307/32; G03F7/004; C07D307/33; C07D315/00; C08F32/00; C08G61/08; G03F7/039; H01L21/027; (IPC1-7): C07D307/33; G03F7/039; H01L21/027; //C08F32/00; C08G61/08
Domestic Patent References:
JP11223950A
JP11344806A
JP10319595A
JP2000187329A
JP11109630A
Foreign References:
WO1999014256A1
Attorney, Agent or Firm:
Takashi Kojima
Yuko Nishikawa



 
Previous Patent: JPS3928689

Next Patent: VEHICULAR HEADLAMP