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Patent Searching and Data


Title:
NEW ONIUM SALT AND RADIO SENSITIVE RESIN COMPOSITION CONTAINING THE SAME
Document Type and Number:
Japanese Patent JP2000053601
Kind Code:
A
Abstract:

To obtain the subject new compound useful as a chemically amplifying type resist.

This resist is a compound of formula I or formula II (R1 and R2 are each an aromatic organic group, an alkyl, a cycloalkyl or the like; R8-R10 are each an aromatic organic group, an alkyl, an aralkyl or the like; R3-R7 are each H, a halogen, nitro, a lower alkoxyl or the like; a total carbon number of R3-R7 is 4-7), e.g. 4-t-butylbenzene sulfonate di(4-t-butylphenyl) iodonium-4-t-butylbenzene sulfonate. The compound of formula I or formula II is obtained by reacting a corresponding specific sulfonic acid or its salt in an aqueous solution of an onium salt synthesized by a known method or in a solution of an organic solvent such as methanol, acetone or acetonitrile and exchanging the salt. The compound of formula I or formula II has a property generating an acid by being exposed with various radioactive rays such as ultraviolet rays or X-rays, excellent in solubility in a solvent and excellent in solubility with various resins.


Inventors:
SUZUKI YASUHIRO
ISHII SHINJI
DONALD W JOHNSON
Application Number:
JP22453298A
Publication Date:
February 22, 2000
Filing Date:
August 07, 1998
Export Citation:
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Assignee:
TOYO GOSEI KOGYO KK
MICRO CHEM CORP
International Classes:
G03F7/004; C07C25/02; C07C43/225; C07C309/28; C07C381/12; C07D327/06; C07D333/46; C07D333/50; C07D333/76; C07D335/02; C07D335/10; C08L101/02; G03F7/038; G03F7/039; (IPC1-7): C07C25/02; C07C43/225; C07C309/28; C07C381/12; C07D327/06; C07D333/46; C07D333/50; C07D333/76; C07D335/02; C07D335/10; C08L101/02; G03F7/004; G03F7/038; G03F7/039
Attorney, Agent or Firm:
Hiroyuki Kurihara