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Patent Searching and Data


Title:
NEW PHOTOSENSITIVE RESIN COMPOSITION SOLUTION AND ITS UTILIZATION
Document Type and Number:
Japanese Patent JP2010006864
Kind Code:
A
Abstract:

To provide a photosensitive resin composition solution which allows fine pattern printing by an inkjet system, is curable by active energy beams and low-temperature heating (250C or below), and has low viscosity despite not containing organic solvents, and to provide a coating film of the photosensitive resin composition obtained from the solution and having good physical properties, and to provide a method for utilizing the same.

The photosensitive resin composition solution contains an imidized tetracarboxylic acid with a specific structure, a diamine- and/or isocyanate-based compound, a photosensitive resin, and a photopolymerization initiator, contains no organic solvents, and has viscosity of 100 mPa s or less at 25C.


Inventors:
SEKITO YOSHIHIDE
Application Number:
JP2008164607A
Publication Date:
January 14, 2010
Filing Date:
June 24, 2008
Export Citation:
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Assignee:
KANEKA CORP
International Classes:
C08G73/10; B41M5/00; C09D5/00; C09D5/25; C09D7/12; C09D11/00; C09D11/30; C09D179/08; H05K1/03