Title:
新規なポリマー及びそれらを含有してなるフォトレジスト組成物
Document Type and Number:
Japanese Patent JP4421710
Kind Code:
B2
Abstract:
The present invention provides novel polymers and photoresist compositions that comprise the polymers as a resin binder component. The photoresist compositions of the invention can provide highly resolved relief images upon exposure to short wavelengths, including 193 nm and 248 nm. The resists of the invention are also useful or imaging at other wavelengths such as 365 nm. Polymers of the invention include those that comprise a photogenerated acid-labile unit that is ester group that comprises an alkyl moiety having about 5 or more carbon atoms and at least two secondary, tertiary or quaternary carbon atoms. The alkyl moiety of the ester group can be a noncyclic or single ring alicyclic group. The carboxyl (C=O(+E,uns O+EE )) oxygen of the ester group is often preferably directly bonded to a quaternary carbon atom.
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Inventors:
Peter Trefonas Third
Gary N. Taylor
George Gee Berkeley
Gary N. Taylor
George Gee Berkeley
Application Number:
JP28327199A
Publication Date:
February 24, 2010
Filing Date:
August 30, 1999
Export Citation:
Assignee:
Rohm and Haas Electronic Materials, L.L.C.
International Classes:
G03F7/039; C07C67/14; C07C69/54; C08L33/08; C08L33/10; G03F7/028; H01L21/027; G03F7/004
Domestic Patent References:
| JP5113667A | ||||
| JP8101509A | ||||
| JP10060056A | ||||
| JP10232495A | ||||
| JP10307397A | ||||
| JP10307398A |
Attorney, Agent or Firm:
Norio Saeki