Title:
新規スルホン酸塩及びその誘導体、光酸発生剤並びにこれを用いたレジスト材料及びパターン形成方法
Document Type and Number:
Japanese Patent JP4816921
Kind Code:
B2
Inventors:
Yoichi Osawa
Takeshi Watanabe
Tsuyoshi Kanao
Katsuhiro Kobayashi
Takeshi Watanabe
Tsuyoshi Kanao
Katsuhiro Kobayashi
Application Number:
JP2006093303A
Publication Date:
November 16, 2011
Filing Date:
March 30, 2006
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
C07C309/12; C07C25/00; C07C309/68; C07C381/12; C07D207/46; C07D209/48; C07D209/76; C07D221/14; C07D333/46; C07D491/18; G03F7/004; G03F7/039; G03F7/075; H01L21/027
Domestic Patent References:
| JP2006504785A | ||||
| JP2007145803A | ||||
| JP2007145804A | ||||
| JP2007304490A |
Attorney, Agent or Firm:
Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa