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Patent Searching and Data


Title:
NEW SULFONIUM SALT COMPOUND AND METHOD FOR PRODUCING THE SAME
Document Type and Number:
Japanese Patent JP2003342254
Kind Code:
A
Abstract:

To obtain a sulfonium salt compound having good transparency to ultraviolet light with ≤220 nm wavelength, having high photo-reactive efficiency (photo-oxidative efficiency) and suitable as a new photo acid generator and to provide a method for producing the sulfonium salt compound.

The sulfonium salt compound is represented by formula (I) [wherein R1 is a group selected from the group consisting of a 2-15C straight- chain or branched divalent or trivalent hydrocarbon group, a cyclic divalent or trivalent hydrocarbon group, a straight-chain or branched divalent or trivalent hydrocarbon group containing an oxygen atom and a cyclic divalent or trivalent hydrocarbon group containing an oxygen atom; R2 is a 1-8C alkylene group which may be a substituent group; R3 and R4 are same or different and represents a group selected from groups consisting of a 1-10C straight-chain or branched alkyl group and a 3-9C cycloalkyl group, and R3 and R4 together may form a ring; X- is a pair ion and (l) is an integer of 2 or 3].


Inventors:
YAMANAKA TOMOTAKA
HAYAKAWA MASAMICHI
IKETANI TAKESHI
Application Number:
JP2002148632A
Publication Date:
December 03, 2003
Filing Date:
May 23, 2002
Export Citation:
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Assignee:
TOYO GOSEI KOGYO KK
International Classes:
G03F7/004; C07C381/12; C07D333/46; (IPC1-7): C07C381/12; C07D333/46; G03F7/004
Attorney, Agent or Firm:
Hiroyuki Kurihara