Title:
含窒素有機化合物、化学増幅型レジスト材料及びパターン形成方法
Document Type and Number:
Japanese Patent JP4502115
Kind Code:
B2
Abstract:
Chemically amplified resist compositions comprising nitrogen-containing organic compounds having a 7-oxanorbornane-2-carboxylic ester structure have resolution and provide a precise pattern profile and are useful in microfabrication using electron beams or deep-UV light.
Inventors:
Takeshi Watanabe
Koji Hasegawa
Katsuya Takemura
Kazumi Noda
Koji Hasegawa
Katsuya Takemura
Kazumi Noda
Application Number:
JP2004128478A
Publication Date:
July 14, 2010
Filing Date:
April 23, 2004
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
C07D493/08; G03F7/004; G03C1/492; G03F7/039; H01L21/027; G03F7/075
Domestic Patent References:
| JP7134419A | ||||
| JP7062026A | ||||
| JP5232706A | ||||
| JP2001089539A | ||||
| JP2004083532A | ||||
| JP2002371114A | ||||
| JP10207058A |
Attorney, Agent or Firm:
Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa