Title:
非侵襲物質分析
Document Type and Number:
Japanese Patent JP6858565
Kind Code:
B2
Abstract:
A method and apparatus for analyzing a substance is disclosed. An optical medium is arranged on a substance surface with at least one region of the optical medium surface in contact with the substance surface. An excitation light beam is emitted through the contacting region of the medium surface (to the substance surface. A measurement light beam is emitted through the optical medium to the contacting region of the medium surface such that the measurement light beam and the excitation light beam overlap on the interface of the optical medium and of the substance surface, on which the measurement light beam is reflected. A deflection of the reflected measurement light beam is detected in dependence on the wavelength of the excitation light beam. The substance is then analyzed based on the detected deflection of the measurement light beam in dependence on the wavelength of the excitation light beam.
Inventors:
Berner, Mentel
Miguel, Angel, Praitez, Rafael
Tobias, Rebrain
Otto, Herzberg
Alexander, Bauer
Hermann, Von, Lilienfeld-Toar
Arne, Cuder
Tabea, Pfool
Miguel, Angel, Praitez, Rafael
Tobias, Rebrain
Otto, Herzberg
Alexander, Bauer
Hermann, Von, Lilienfeld-Toar
Arne, Cuder
Tabea, Pfool
Application Number:
JP2016574190A
Publication Date:
April 14, 2021
Filing Date:
June 16, 2015
Export Citation:
Assignee:
DiaMonTech AG
International Classes:
G01N21/3581; A61B5/1455; G01N21/39; G01N21/552
Domestic Patent References:
| JP2012070907A | ||||
| JP2005127748A | ||||
| JP63063945A | ||||
| JP2846079B2 | ||||
| JP2008125542A | ||||
| JP2007170960A | ||||
| JP2009539085A | ||||
| JP2013213736A | ||||
| JP2000074861A | ||||
| JP63277957A |
Foreign References:
| US4529319 |
Attorney, Agent or Firm:
Hiroyuki Nagai
Yukitaka Nakamura
Yasukazu Sato
Satoru Asakura
Takeshi Sekine
Yukitaka Nakamura
Yasukazu Sato
Satoru Asakura
Takeshi Sekine