NOVEL MANUFACTURE OF 4-PHENYL-PYRROLE DERIVATIVES, FUNGICIDEAND EXPULSION OF FUNGI

Title:

NOVEL MANUFACTURE OF 4-PHENYL-PYRROLE DERIVATIVES, FUNGICIDEAND EXPULSION OF FUNGI

Document Type and Number:

Japanese Patent JPS6197262

Kind Code:

A

Abstract:

There is described a process for producing fungicidally active 4-phenylpyrrole derivatives of the formula I (I) wherein R is halogen, C1-C6-alkyl or C1-C6-haloalkyl, and n is 0, 1 or 2, which process comprises reacting a 3-trifluoromethyl-4-phenylpyrrole of the formula II (II) wherein Rn is as defined under the formula I, and R1 is hydrogen or an acyl group, at elevated temperature and elevated pressure, with ammonia. Important intermediates and the production thereof are also described.

Inventors:

PIEERU MARUTEIN
ROBAATO BUERUNAA RANKU

Application Number:

JP22899885A

Publication Date:

May 15, 1986

Filing Date:

October 16, 1985

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Assignee:

CIBA GEIGY AG

International Classes:

A01N43/36; A01N47/16; C07B43/08; C07C45/45; C07C49/255; C07D207/33; C07D207/34; C07C43/176; (IPC1-7): C07D207/34

Attorney, Agent or Firm:

Wakabayashi Tadashi

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