Title:
NOVEL POLYAMIC ACID, POLYIMIDE, AND ITS USE
Document Type and Number:
Japanese Patent JP2008308551
Kind Code:
A
Abstract:
To provide a polyimide resin with high transparency useful as a circuit material, excellent in warpage-proof property, soluble in an organic solvent of a low boiling point and capable of being imidized at a low temperature, and a polyamic acid, i.e., its precursor.
The novel polyamic acid contains a tetracarboxylic acid dianhydride represented by formula (1) and a diamine (I) represented by formula (2): (wherein R represents a 5-19C alkylene group which may be substituted by a halogen atom) as essential components.
Inventors:
HIROTA KOSUKE
FUNAKI KATSUHIKO
FUNAKI KATSUHIKO
Application Number:
JP2007156602A
Publication Date:
December 25, 2008
Filing Date:
June 13, 2007
Export Citation:
Assignee:
MITSUI CHEMICALS INC
International Classes:
B32B27/34; C08G73/10; C09J7/00; C09J179/08; H05K1/03
Domestic Patent References:
JPH11286547A | 1999-10-19 | |||
JPH11222522A | 1999-08-17 | |||
JP2002338929A | 2002-11-27 | |||
JP2000098390A | 2000-04-07 |
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