Title:
オニウム塩、化学増幅ポジ型レジスト組成物及びレジストパターン形成方法
Document Type and Number:
Japanese Patent JP7067271
Kind Code:
B2
Abstract:
An onium salt of arenesulfonic acid having a bridged ring-containing group generates a bulky acid having an appropriate strength and controlled diffusion. When a positive resist composition comprising the onium salt and a base polymer is processed by lithography, a pattern of rectangular profile having high resolution and reduced LER is formed.
Inventors:
Naoya Inoue
Satoshi Watanabe
General Domon
Satoshi Watanabe
General Domon
Application Number:
JP2018100517A
Publication Date:
May 16, 2022
Filing Date:
May 25, 2018
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
C07C309/73; C07C381/12; C07D327/08; C07D493/08; C08F212/08; C08F220/10; C09K3/00; G03F7/004; G03F7/039; G03F7/20
Domestic Patent References:
| JP2010100604A | ||||
| JP2008268931A | ||||
| JP2016065016A | ||||
| JP2013160955A | ||||
| JP2016200805A |
Attorney, Agent or Firm:
Hideaki International Patent Office
Previous Patent: Information processing device, load program and load method
Next Patent: How to create a work drawing automatically
Next Patent: How to create a work drawing automatically