Title:
ONIUM SALT, RESIST COMPOSITION AND PATTERNING PROCESS
Document Type and Number:
Japanese Patent JP2016210761
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a photoacid generator or the like to be used for a chemically amplified resist composition having reduced acid diffusion, an excellent balance of sensitivity and mask error factor (MEF), excellent rectangularity, excellent compatibility and minimal defects in photolithography using high energy beams as a light source such as ArF excimer laser light, EB, and EUV.SOLUTION: An onium salt represented by formula (1) below is provided.SELECTED DRAWING: None
Inventors:
FUJIWARA NORIYUKI
OHASHI MASAKI
TANIGUCHI RYOSUKE
OHASHI MASAKI
TANIGUCHI RYOSUKE
Application Number:
JP2016065649A
Publication Date:
December 15, 2016
Filing Date:
March 29, 2016
Export Citation:
Assignee:
SHINETSU CHEMICAL CO
International Classes:
C07C311/48; C07C25/18; C07C313/36; C07C381/12; C07D307/00; C07J9/00; C08F220/18; C08F220/28; C09K3/00; G03F7/004; G03F7/038; G03F7/039; G03F7/11; G03F7/20
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Attorney, Agent or Firm:
Hideaki International Patent Office
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