Title:
ONIUM SULFONATE COMPOUND, METHOD FOR PRODUCING THE COMPOUND, PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE MATERIAL USING THE SAME
Document Type and Number:
Japanese Patent JP2003267968
Kind Code:
A
Abstract:
To provide a photo acid generator, one component of a chemical amplification photo resist which has spectral sensitivity in the visible light region, especially argon laser light (488 nm or 514 nm) and can improve workability.
A photosensitive material basically comprising a photo acid generator and a polymer whose solubility in an alkali aqueous solution is increased by the action of an acid, and exhibiting a positive type behavior is characterized by using an onium sulfonate compound as the photo acid generator.
Inventors:
TARUMOTO NAOHIRO
YAMAOKA TSUGIO
YOSHIKAWA KATSUMASA
YAMAZAKI HAJIME
YAMAOKA TSUGIO
YOSHIKAWA KATSUMASA
YAMAZAKI HAJIME
Application Number:
JP2002068269A
Publication Date:
September 25, 2003
Filing Date:
March 13, 2002
Export Citation:
Assignee:
HODOGAYA CHEMICAL CO LTD
International Classes:
G03F7/004; C07C25/02; C07C25/18; C07C381/12; C07D311/80; C07D327/06; C07D333/46; C07D335/02; C07D335/10; C07D339/06; C07D347/00; C07D491/052; C07D491/22; (IPC1-7): C07D311/80; C07C25/02; C07C25/18; C07C381/12; C07D327/06; C07D333/46; C07D335/02; C07D335/10; C07D339/06; C07D347/00; C07D491/052; C07D491/22; G03F7/004
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