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Title:
光学装置、スキャン方法、リソグラフィ装置及びデバイス製造方法
Document Type and Number:
Japanese Patent JP5466721
Kind Code:
B2
Abstract:
An apparatus measures positions of marks on a lithographic substrate. A measurement optical system comprises illumination subsystem for illuminating the mark with a spot of radiation and a detecting subsystem for detecting radiation diffracted by the mark. A tilting mirror moves the spot of radiation relative to the reference frame of the measurement optical system synchronously with a scanning motion of the mark itself, to allow more time for accurate position measurements to be acquired. The mirror tilt axis is arranged along the intersection of the mirror plane with a pupil plane of the objective lens to minimize artifacts of the scanning. The same geometrical arrangement can be used for scanning in other types of apparatus, for example a confocal microscope.

Inventors:
Den bouff, allie, jeffrey
Application Number:
JP2012027606A
Publication Date:
April 09, 2014
Filing Date:
February 10, 2012
Export Citation:
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Assignee:
AS M Netherlands B.V.
International Classes:
G01B11/00; H01L21/027; G03F9/00
Domestic Patent References:
JP61080215A
JP2232918A
JP2009186555A
JP2003247807A
JP2008263187A
JP6302499A
JP2009047460A
JP2012191177A
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki