Title:
光記録材料、光記録方法、感光性材料、フォトリソグラフィー方法、光重合開始剤、及び光増感剤
Document Type and Number:
Japanese Patent JP5037632
Kind Code:
B2
Abstract:
Provided is a nonlinear optical material an optical recording maternal, an optical recording method, a photosensitive material, a photopolymerization initiator, and a photosensitizer. One exemplary aspect of the present invention is a photosensitive material used for photolithography for forming a pattern by irradiating a photoresist with excitation light which includes a donor molecule 11 that is excited by the excitation light, and an acceptor molecule 12 that is excited by energy transfer or charge transfer from the excited donor 11.
Inventors:
Katsumasa Fujita
Minoru Kobayashi
Kikuchi Kazuya
Susumu water
Satoshi Kawata
Shogo Kono
Minoru Kobayashi
Kikuchi Kazuya
Susumu water
Satoshi Kawata
Shogo Kono
Application Number:
JP2009551543A
Publication Date:
October 03, 2012
Filing Date:
January 28, 2009
Export Citation:
Assignee:
National University Corporation Osaka University
Nano Photon Co., Ltd.
Nano Photon Co., Ltd.
International Classes:
G03F7/028; G02F1/361; G03C1/73; G11B7/24035; G11B7/244; G11B7/2467
Domestic Patent References:
| JP2005141128A | 2005-06-02 | |||
| JP2005285162A | 2005-10-13 | |||
| JP2007246723A | 2007-09-27 | |||
| JPH06337496A | 1994-12-06 |
Foreign References:
| WO2006098296A1 | 2006-09-21 |
Attorney, Agent or Firm:
Ken Ieiri