Title:
OPTICAL SCANNER
Document Type and Number:
Japanese Patent JP3680896
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To make an optical scanner have a simple transmission optical system in the optical scanner on which a light beam is made incident twice by making mirrors form ing a bent optical path have the function of the rear group in the afocal optical system of a transmission optical system and the function of a lens for compensating a plane tilt and to reduce the number of sheets of the lenses.
SOLUTION: This optical scanner is provided with a light beams light source, a rotary polygon mirror 4 having plural reflecting surfaces reflectingly deflecting a light beam from the light source, a transmission optical system 22 making the light beam reflectingly deflected by the first reflecting surface 5 of the rotary polygon mirror 4 transmissively incident on the second reflecting surface 6 of the mirror 4 and a scanning system making the light beam reflectingly deflected by the second reflecting surface 6 form and scan a beam spot on a surface to be scanned and is made to include reflection mirros which have curved faces 10, 13 in the transmission optical system.
Inventors:
Takada ball
Nozomi Inoue
Hama Takashi
Nozomi Inoue
Hama Takashi
Application Number:
JP24097597A
Publication Date:
August 10, 2005
Filing Date:
September 05, 1997
Export Citation:
Assignee:
Seiko Epson Corporation
International Classes:
G02B5/10; G02B26/10; G02B26/12; (IPC1-7): G02B26/10; G02B5/10
Domestic Patent References:
JP60239706A | ||||
JP57196270A | ||||
JP53097448A | ||||
JP6003616A | ||||
JP51032340A | ||||
JP9159963A | ||||
JP9203875A |
Foreign References:
US4230394 |
Attorney, Agent or Firm:
Hiroshi Nagisawa
Ryukichi Abe
Hirukawa Masanobu
Norihiko Uchida
Hideo Sugai
Kenji Aoki
Akira Yonezawa
Ryukichi Abe
Hirukawa Masanobu
Norihiko Uchida
Hideo Sugai
Kenji Aoki
Akira Yonezawa
Previous Patent: WAFER HOLDING METHOD FOR WAFER POLISHING DEVICE
Next Patent: PROCESSING SOLUTION DISCHARGE NOZZLE OF SUBSTRATE TREATING DEVICE
Next Patent: PROCESSING SOLUTION DISCHARGE NOZZLE OF SUBSTRATE TREATING DEVICE