Title:
OPTICAL WAVEGUIDE SUBSTRATE, OPTICAL MODULE AND MANUFACTURE OF OPTICAL WAVEGUIDE SUBSTRATE
Document Type and Number:
Japanese Patent JP3177769
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To form an optical waveguide and an optical element alignment structure at almost the same time, simplify processes and improve a yield by forming a polygonally columnar rod optical waveguide of silicon containing impurities on a silicon substrate.
SOLUTION: A trapezoidal and angularly columnar rod optical waveguide 11 of silicon in which impurities are diffused is formed on a silicon substrate 12. The waveguide 11 with impurities diffused has larger refractivity than the silicon substrate 12. On this account, light is prevented from leaking from the waveguide 11 to the silicon substrate 12. If single crystal silicon is used for the silicon substrate 12 to apply epitaxial growth reflecting the crystal orientation of the silicon substrate during layering, the silicon substrate 12 and a silicon layer formed thereon the have the same crystal orientation as a whole. In this way, aeolotropic etching for which the crystal orientation is used is applicable in the next etching process and the optical waveguide 11 is more easily manufactured with precision.
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Inventors:
Ryoji Kaku
Application Number:
JP11860897A
Publication Date:
June 18, 2001
Filing Date:
April 02, 1997
Export Citation:
Assignee:
Japan Aviation Electronics Industry Co., Ltd.
International Classes:
G02B6/30; G02B6/12; G02B6/13; (IPC1-7): G02B6/30
Domestic Patent References:
| JP4313710A | ||||
| JP269703A |