Title:
有機ELの成膜装置および蒸着装置
Document Type and Number:
Japanese Patent JP4880647
Kind Code:
B2
Abstract:
Provided is a deposition apparatus for organic EL capable of allowing vapor of a film forming material to be vapor deposited on a target object to be uniformly heated. A deposition apparatus, which performs a film forming process by vapor depositing a film forming material on a target object in a depressurized processing chamber, includes an evaporating head having a vapor discharge opening, disposed in the processing chamber, for discharging vapor of the film forming material. Inside the evaporating head, provided is a heater receiving member which is sealed with respect to an inside of the processing chamber, and installed is a communication path which allows the heater receiving member to communicate with an outside of the processing chamber. A power supply line for a heater received in the heater receiving member is disposed in the communication path and extended to the outside of the processing chamber.
Inventors:
Yagi Yasushi
Shingo Watanabe
Yuji Ono
Yuko Kaneko
Kosuke Hasegawa
Mitsuaki Omino
Shingo Watanabe
Yuji Ono
Yuko Kaneko
Kosuke Hasegawa
Mitsuaki Omino
Application Number:
JP2008171979A
Publication Date:
February 22, 2012
Filing Date:
July 01, 2008
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H05B33/10; C23C14/24; H01L51/50
Domestic Patent References:
| JP2008088483A | ||||
| JP2006249572A | ||||
| JP6020462U | ||||
| JP2000239831A | ||||
| JP2004353082A | ||||
| JP2002272606A | ||||
| JP2007332458A | ||||
| JP2008523245A | ||||
| JP2001335395A | ||||
| JP2005002450A |
Foreign References:
| FR2878863A1 |
Attorney, Agent or Firm:
Koji Hagiwara
Tetsuo Kanamoto
Miaki Kametani
Tetsuo Kanamoto
Miaki Kametani