ORGANOAMINOSILANES AND METHODS FOR MAKING THE SAME

Title:

ORGANOAMINOSILANES AND METHODS FOR MAKING THE SAME

Document Type and Number:

Japanese Patent JP2017066147

Kind Code:

A

Abstract:

PROBLEM TO BE SOLVED: To provide favorable methods for preparing compounds such as organoaminosilanes.SOLUTION: Organoaminosilanes, including, but without limitation, di-iso-propylaminosilane (DIPAS), are precursors for the deposition of silicon containing films such as silicon-oxide and silicon-nitride films. Described herein are methods for making organoaminosilane compounds or other compounds such as organoaminodisilanes and organoaminocarbosilanes via the catalytic hydrosilylation of an imine by a silicon source comprising a hydridosilane.SELECTED DRAWING: None

Inventors:

XIAO MANCHAO
MATTHEW R MACDONALD
HO RICHARD
LEI XINJIAN

Application Number:

JP2016217206A

Publication Date:

April 06, 2017

Filing Date:

November 07, 2016

Export Citation:

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Assignee:

AIR PROD & CHEM

International Classes:

C07F7/10

Domestic Patent References:

JP2015164917A	2015-09-17
JPS49110632A	1974-10-22

Foreign References:

US6072085A

2000-06-06

Other References:

CHEM. COMMUN., vol. 48, JPN6016010162, 2012, pages 151 - 153, ISSN: 0004090444
EUR. J. ORG. CHEM., JPN6016010156, 2005, pages 2881 - 2883, ISSN: 0004090445
CHEMISTRY OF HETEROCYCLIC COMPOUNDS, vol. 38(1), JPN6016010158, 2002, pages 46 - 53, ISSN: 0004090446
TETRAHEDRON LETTERS, vol. (27), JPN6016010159, 1973, pages 2475 - 2478, ISSN: 0004090447
ORGANOMETALLICS, vol. 22(11), JPN6016010161, 2003, pages 2199 - 2201, ISSN: 0004090448

Attorney, Agent or Firm:

Atsushi Aoki
Takashi Ishida
Tetsuji Koga
Satoshi Deno
Naori Kota
Nobuo Sekine

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