Title:
ORGANOMETALLIC COMPLEX AND PRODUCTION METHOD OF METAL-CONTAINING THIN FILM USING THE METAL COMPLEX
Document Type and Number:
Japanese Patent JP2011246438
Kind Code:
A
Abstract:
To provide an organometallic complex having a low melting point, excellent in thermal stability and suitable for film formation by the CVD method, and to provide a production method of a metal-containing thin film using the organometallic complex.
The organometallic complex comprises as the ligand, β-diketonato having an alkoxyalkyl group represented by formula (1) (wherein, M represents a metal atom; X is alkyl having 1-2 alkoxyalkyl parts; Y is X or a 1-8C linear or branched alkyl; Z represents H or the like; and m represents the number of ligands and is equal to the valence of the metal M).
Inventors:
TSUNODA TAKUMI
HASEGAWA CHIHIRO
NIHEI HIROSHI
HASEGAWA CHIHIRO
NIHEI HIROSHI
Application Number:
JP2011023051A
Publication Date:
December 08, 2011
Filing Date:
February 04, 2011
Export Citation:
Assignee:
UBE INDUSTRIES
International Classes:
C07C49/92; C23C16/18; C23C16/40; C07F1/02; C07F1/08; C07F3/00; C07F3/02; C07F3/06; C07F5/00; C07F5/06; C07F15/04; C07F15/06
Attorney, Agent or Firm:
Katsuhiro Ito
Akiko Ono
Akiko Ono
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