Title:
チャンバ部品保護用のオキシフッ化物化合物
Document Type and Number:
Japanese Patent JP7404383
Kind Code:
B2
Abstract:
A method of forming a fluorinated metal film is provided. The method includes positioning an object in an atomic layer deposition (ALD) chamber having a processing region, depositing a metal-oxide containing layer on an object using an atomic layer deposition (ALD) process, depositing a metal-fluorine layer on the metal-oxide containing layer using an activated fluorination process, and repeating the depositing the metal-oxide containing layer and the depositing the metal-oxide containing layer until a fluorinated metal film with a predetermined film thickness is formed. The activated fluorination process includes introducing a first flow of a fluorine precursor (FP) to the processing region. The FP includes at least one organofluorine reagent or at least one fluorinated gas.
Inventors:
Deepak, Nitin
Seth, Thresh Chand
Goradia, Preruna Sonsaria
Bajaj, Giteka
Takare, Darshan
Sun, Jennifer Wai.
Natu, Gayatri
Seth, Thresh Chand
Goradia, Preruna Sonsaria
Bajaj, Giteka
Takare, Darshan
Sun, Jennifer Wai.
Natu, Gayatri
Application Number:
JP2021552676A
Publication Date:
December 25, 2023
Filing Date:
February 26, 2020
Export Citation:
Assignee:
APPLIED MATERIALS,INCORPORATED
International Classes:
C23C16/30; C23C16/40; C23C16/455; H01L21/3065
Domestic Patent References:
| JP2018190985A | ||||
| JP2018511943A |
Foreign References:
| WO2018132789A1 |
Attorney, Agent or Firm:
Sonoda & Kobayashi Patent Attorneys Corporation