【発明の名称】薄膜回路形成用ホ―ロ―基板の製造方法

Title:

【発明の名称】薄膜回路形成用ホ―ロ―基板の製造方法

Document Type and Number:

Japanese Patent JP2542640

Kind Code:

B2

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Inventors:

ITO MASANORI
YAJIMA KYOSHI
OKUYAMA HITOSHI
KUROSAKA AKITO
KATAOKA YOSHIO

Application Number:

JP26781587A

Publication Date:

October 09, 1996

Filing Date:

October 23, 1987

Export Citation:

Assignee:

FUJIKURA KK

International Classes:

C25D13/02; C23D5/00; H05K1/05; H05K3/44; (IPC1-7): H05K3/44; C23D5/00; C25D13/02

Domestic Patent References:

Attorney, Agent or Firm:

Masatake Shiga (1 person outside)

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