Title:
【発明の名称】リソグラフィマスクの欠陥修復方法
Document Type and Number:
Japanese Patent JP2898114
Kind Code:
B2
Abstract:
The invention provides a method by which a transparent defect (3) in a lithographic mask (1) can be effectively restored in a simple manner. For this purpose, the mask (1) is provided with a photosensitive layer (4) and is introduced into a solution of a metal ion (5). Subsequently, the mask is exposed at the area of the defect. The photosensitive layer (4) is capable of depositing the metal ion in the form of metal under the influence of the radiation (6) supplied. According to the invention, the exposure is continued until such a quantity of metal (7) has been deposited that the radiation can no longer penetrate to the photosensitive layer (4). At that instant, the metal deposition is stopped so that overgrowth of the metal deposit (7) is automatically counteracted in a simple manner.
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Inventors:
YOHANESU UIRUHERUMUSU MARIA YAKOBUSU
KURISUCHAN YOHANESU KUREMENTO MARII NIIRESEN
YOHANESU MATEIASU HERARUDASU RITSUKEN
KURISUCHAN YOHANESU KUREMENTO MARII NIIRESEN
YOHANESU MATEIASU HERARUDASU RITSUKEN
Application Number:
JP5762791A
Publication Date:
May 31, 1999
Filing Date:
March 01, 1991
Export Citation:
Assignee:
KONIN* FUIRITSUPUSU EREKUTORONIKUSU NV
International Classes:
C23C18/16; H01L21/027; H01L21/30; G03F1/08; H05K3/00; H05K3/18; H05K3/22; (IPC1-7): G03F1/08; H01L21/027
Domestic Patent References:
| JP3102352A |
Attorney, Agent or Firm:
Akihide Sugimura (5 outside)