Title:
【発明の名称】プラズマ装置およびRF電力波の電流と電圧の振幅と相対位相の情報誘導の方法
Document Type and Number:
Japanese Patent JP2911031
Kind Code:
B2
Abstract:
An RF probe for a plasma chamber picks up current and voltage samples of the RF power applied to an RF plasma chamber, and the RF voltage and current waveforms are supplied to respective mixers. A local oscillator supplies both mixers with a local oscillator signal at the RF frequency plus or minus about 15 KHz, so that the mixers provide respective voltage and current baseband signals that are frequency shifted down to the audio range. The phase relation of the applied current and voltage is preserved in the baseband signals. These baseband signals are then applied to a stereo, two-channel A/D converter, which provides a serial digital signal to a digital signal processor or DSP. A local oscillator interface brings a feedback signal from the DSP to the local oscillator. The DSP can be suitably programmed to obtain complex Fast Fourier Transforms of the voltage and current baseband samples. The frequency-domain spectra are analyzed to obtain, with great accuracy, magnitude of voltage and current and phase angle. Other parameters are derived from these three.
Inventors:
KEBIN ESU GERITSUSHU
DANIERU EFU BOONA
DANIERU EFU BOONA
Application Number:
JP2334897A
Publication Date:
June 23, 1999
Filing Date:
January 22, 1997
Export Citation:
Assignee:
II ENU AI A DEIBIJON OBU ASUTETSUKU AMERIKA INC
International Classes:
H01J37/32; H01L21/205; H01L21/302; H05H1/46; H01L21/3065; H05H1/00; (IPC1-7): H05H1/46; H01L21/205; H01L21/3065
Attorney, Agent or Firm:
Yoshihisa Oshida