Title:
【発明の名称】基板の処理方法
Document Type and Number:
Japanese Patent JPH0721638
Kind Code:
B2
Abstract:
The improvement of the invention consists in the use of a specific ether compound, e.g., diethyleneglycol monomethyl, monoethyl and monobutyl ethers, dipropyleneglycol monomethyl and monoethyl ethers, triethyleneglycol monomethyl and monoethyl ethers and tripropyleneglycol monomethyl ether, as a rinse solvent for a substrate from which the pattern photoresist layer has been removed with a remover solution in the photolithographic processing of semiconductor devices. The rinse solvent is free from the problems in the toxicity to human body and environment pollution relative to waste disposal as well as the danger of fire. The rinse solvent is versatile to be applicable to both of the negative- and positive-working photoresist compositions. Further advantages are obtained by adding an aliphatic amine compound to the rinse solvent.
Inventors:
Kobayashi Masakazu
Asami Shingo
Tanaka Hatsuyuki
Asami Shingo
Tanaka Hatsuyuki
Application Number:
JP16789886A
Publication Date:
March 08, 1995
Filing Date:
July 18, 1986
Export Citation:
Assignee:
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
H01L21/30; G03C11/00; G03F7/00; G03F7/26; G03F7/42; H01L21/027; H01L21/461; (IPC1-7): G03F7/26; H01L21/027
Domestic Patent References:
| JP56155942A | ||||
| JP5178402A | ||||
| JP60147736A | ||||
| JP4923783B1 |
Attorney, Agent or Firm:
Agata Akira
Next Patent: パターン形成方法