平行線型マスクおよびその製造方法

Japanese Patent JP3741590

B2

PROBLEM TO BE SOLVED: To provide a parallel-line mask composed of short fibers, in which the variation of a stripe width i.e., pitch is reduced and parallel pitch is maintained with high accuracy. SOLUTION: The parallel-line-type mask can be manufactured by: regarding a part forming a parallel-line mask part as the warp or weft, preparing masking cloth into which the warp or weft is woven and in which the parallel pitch of the warp or weft is held, allowing the cloth to adhere to a mask frame or plate-like substrata, and then removing the warp or weft to form a parallel- line mask part; or arranging the warp for forming a parallel-line mask part into parallel form by the use of a metal reed or a pitch gage jig and allowing the warp in a stretched state to adhere to the mask frame or plate-like substrate to form a parallel-line mask part. By this method, the manufacturing process can be remarkably shortened as compared with that by the conventional method by photolithography, and also the parallel-line-type mask in which stripe width i.e., pitch dispersion is minimized even in the case of parallel pitch as fine as 330 μm and the parallel pitch is held with high accuracy can be obtained. This parallel-line-type mask can be suitably used, e.g. for a vapor deposition mask.

WO/2022/041891

MASK AND MASK ASSEMBLY

Wakabayashi Moritsumitsu
Nobuyuki Miyama
Koizumi Kimiaki
Akihiro Nakagome

JP2000141575A

February 01, 2006

May 15, 2000

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nbc corporation

C23C14/04; D03D1/00; D03D13/00; D03D15/68; H01L51/50; H05B33/10

JP43002599B1
JP58025738B1
JP9263932A
JP36010604B1
JP49041268B1
JP55013590B1
JP2000144382A

Isamu Hosoi

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