To make magnetic shield of an electrostatic lens system easy by reducing a space especially occupied by a lens.
In a charged particle beam exposure device, an electrostatic lens (ML) has some (at least three) electrodes surrounding a particle beam optical path with rotational symmetry (EFR, EM, EFN), and the electrodes are coaxially arranged on a common optical axis indicating a center of the optical path and has different electrostatic potentials applied through a power supply system. At least one sub set (a partial aggregate) of the electrode (EM) forms an electrode array realized as a series of electrodes continuously arranged along the optical axis and in a substantially equivalent shape. An outside part of the electrode (EM) of the electrode array has outside parts (OR) of corresponding opposite faces (f1, f2) respectively facing toward the next and the preceding electrodes. A length of the electrode (EM) is preferably at least 4.1 times (3 times) of an inner radius (ril) of the faces (fi, f2).
BUSCHBECK HERBERT
LAMMER GERTRAUD
| JP2001283755A | 2001-10-12 | |||
| JPH088097A | 1996-01-12 | |||
| JPH0384839A | 1991-04-10 | |||
| JP2001243908A | 2001-09-07 | |||
| JPH05334979A | 1993-12-17 |
Kiyoji Muraki
Kenichi Nakayama
Hashimoto Chikako
Sayaka Matsushima
High Iku child
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