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Title:
PATTERN CORRECTION
Document Type and Number:
Japanese Patent JPS5457964
Kind Code:
A
Abstract:
PURPOSE:To correct a pattern by irradiating the pattern material layer part corresponding to the defect of the pattern with laser beam. CONSTITUTION:Laser beam is irradiated from the part above defect 9 of pattern 8 on substrate 7 through pattern materials 6. Laser beam is condensed by a lens to melt materials 6, and the surface tension is utilized to print materials 6 to the substrate, thereby correcting defect 9. Thus, pattern materials 6 are melted or are made into gas by laser beam, and materials 6 are printed to the substrate, so that an effective correction can be performed.

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Inventors:
NAKASHIMA MASAHITO
FUJIWARA KATSUMI
Application Number:
JP12479477A
Publication Date:
May 10, 1979
Filing Date:
October 18, 1977
Export Citation:
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Assignee:
FUJITSU LTD
International Classes:
G01B9/02; G01B11/26; G03F1/00; G03F1/72; H01L21/027; H01L21/302; H05K13/00; (IPC1-7): G01B9/02; G01B11/26; H01L21/302; H05K13/00



 
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