Title:
パターン膜、パターン膜の形成方法、インプリントモールドの製造方法、およびパターン構造体の製造方法
Document Type and Number:
Japanese Patent JP7338269
Kind Code:
B2
Abstract:
To provide a formation method of a pattern film which can easily manufacture a pattern film having a special structure.SOLUTION: A pattern film comprises: a first region made of a first pattern having a convex portion and a concave portion; a second region made of a second pattern having a convex portion and a concave portion; and a third region made of a third pattern having a convex portion and a concave portion. The area ratio XA1/XB1 of the convex portion/concave portion of the first pattern occupying the first region, the area ratio XA2/XSB2 of the convex portion/concave portion of the second pattern occupying the second region and the area ratio XA3/XSB3 of the convex portion/concave portion of the third pattern occupying the third region satisfy a formula (I). The inclination Y1 of a side wall of the convex portion of the first pattern, the inclination Y2 of the side wall of the convex portion of the second pattern and the inclination Y3 of the side wall of the convex portion of the third pattern satisfy the relation of a formula (II) and a formula (III). SA1/SB1
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Inventors:
Yoshimi Inaba
Application Number:
JP2019122931A
Publication Date:
September 05, 2023
Filing Date:
July 01, 2019
Export Citation:
Assignee:
Toppan Printing Co., Ltd.
International Classes:
H01L21/027; B29C33/38
Domestic Patent References:
| JP2004148301A | ||||
| JP2005064023A |
Foreign References:
| WO2007144967A1 |
Attorney, Agent or Firm:
Patent Attorney Corporation Suzue Patent General Office
Masatoshi Kurata
Nobuhisa Nogawa
Naoki Kawano
Tadashi Inoue
Shigeru Iino
Sanae Kaneko
Masatoshi Kurata
Nobuhisa Nogawa
Naoki Kawano
Tadashi Inoue
Shigeru Iino
Sanae Kaneko